https://github.com/brave-tarnished/gpu-accelerated-opc

Optical Proximity Correction (OPC) is a photolithography technique that modifies photomask geometry to counteract diffraction and process effects, ensuring accurate printing of patterns on the wafer. This work demonstrates a proof of concept showing how using a GPU-based approach can significantly speed up these modifications compared to a CPU.
https://github.com/brave-tarnished/gpu-accelerated-opc

cpp cuda gpu-acceleration photolithography semiconductors

Last synced: 9 months ago
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Optical Proximity Correction (OPC) is a photolithography technique that modifies photomask geometry to counteract diffraction and process effects, ensuring accurate printing of patterns on the wafer. This work demonstrates a proof of concept showing how using a GPU-based approach can significantly speed up these modifications compared to a CPU.

• Host: GitHub
• URL: https://github.com/brave-tarnished/gpu-accelerated-opc
• Owner: brave-tarnished
• Created: 2025-08-21T13:53:20.000Z (10 months ago)
• Default Branch: main
• Last Pushed: 2025-08-21T15:19:14.000Z (10 months ago)
• Last Synced: 2025-08-21T15:55:05.904Z (10 months ago)
• Topics: cpp, cuda, gpu-acceleration, photolithography, semiconductors
• Language: C
• Homepage:
• Size: 59.6 KB
• Stars: 0
• Watchers: 0
• Forks: 0
• Open Issues: 0
• Metadata Files:
  • Readme: README.md

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# GPU Accelerated OPC

Optical Proximity Correction (OPC) is a photolithography technique that modifies photomask geometry to counteract diffraction and process effects, ensuring accurate printing of patterns on the wafer. 

This work demonstrates a proof of concept showing how using a GPU-based approach can significantly speed up these modifications compared to a CPU.